A.Frigo, G.Lanza,A.Minarello H.Padamsee, V.Palmieri Università degli Studi di Padova Cornell University
Advantages and disadvanteges of the bias tecnique Preliminary results of a mixed bias-magnetron sputtering configuration for coating Niobium on copper 1.5 GHz cavities First applications of a large area cavity shaped cathode in the bias diode sputtering configuration.
The positive bias applyed to the grid between target and substrates promotes IONIC BOMBARDMENT OF THE GROWING FILM The positive bias applyed to the grid between target and substrates promotes IONIC BOMBARDMENT OF THE GROWING FILM
IONIC BOMBARDMENT OF THE GROWING FILM IONIC BOMBARDMENT OF THE GROWING FILM
Impurities are preferentially removed relative to the atoms of the main film. Impurities are preferentially removed relative to the atoms of the main film.
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